The variation of the film composition can be monitored by using the method of spectrum analysis during the film deposition ( for the intensity of the persistent line is proportional to the particle density of the element in the vacuum chamber ) . the measurement of the transmission spectrum of the film on a transparent substrate can be used to calculate the film parameters , such as refractive index , extinction coefficient and the thickness of the film . therefore , the combination of the two methods would be helpful to on line monitoring the film constituents and the optical paramenters in the preparation of thin films 在制備薄膜的過(guò)程中,利用光譜分析的方法,以放電光譜特征譜線強(qiáng)度的變化來(lái)反映相應(yīng)物質(zhì)成分的變化,以連續(xù)光譜光源發(fā)出的光透射過(guò)薄膜的透射率的變化,來(lái)反映薄膜的厚度、折射率、吸收系數(shù)等光學(xué)參數(shù)的變化,從而達(dá)到在制膜過(guò)程中,對(duì)薄膜的成分、厚度等參數(shù)進(jìn)行在線監(jiān)控的目的